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Photochemical

High-purity, UPE, nylon polyimide membranes

Liquid filtration of photochemicals used in photolithography applications such as: Resists, ARC, BARC, TARC, SOD and Dielectrics. The filters are available in a nylon, UPE (ultra high molecular weight polyethylene) and polyimide membranes with various disposable filter sizes and form factors to work with many dispense systems. 
Impact® Plus Filter
Point-of-use filter for photochemicals, including photoresists and solvents
  • Ultra-high molecular weight polyethylene (UPE) membrane technology
  • Rapid filter change-out design
  • Low hold-up volume limits chemical waste
  • Designed for use with the Impact® ST manifold and IntelliGen® Mini dispense system
Impact® 2 Filter Family
Rapid change-out UPE membrane filters for point-of-use photochemical filtration, including photoresists and solvents
  • Developed for use with the Impact® 2 manifold and IntelliGen® dispense systems
  • Point-of-use photochemical and solvent filtration
  • Minimal chemical exposure, rapid connection design
  • UPE and surface modified UPE membrane technology
  • Low hold-up volume minimizes chemical waste
Impact® Mini Filters - Ultra-low hold-up volume
Rapid change-out UPE membrane filter for point-of-use photochemical filtration, including photoresists and solvents
  • Ultra-low hold-up volume minimizes chemical waste, reduces opportunities for nucleation sites
  • Low surface area reduces chemical waste during filter startup
  • Lower surface area and elimination of a cage insures lower extractables and ultra cleanliness
  • Designed for use with IntelliGen® Mini dispense system
Microgard™ LE Nylon Cartridge Filters
Hydrophillic polyamide filters for bulk filtration applications
  • Hydrophillic polyamide filters with superior cleanliness, ideal for aqueous and organic solutions
  • Available in 10 and 20 nm retention ratings - Validated with Entegris FS sub-30 nm retention rating test method
  • Unique nylon membrane design that enables both optimum retention and maximum flow
  • Proprietary cleaning technology to meet the needs of more sophisticated resists