Entegris has a unique ability to address all gas contamination needs in the fab with a full range of chemical filtration and purification products as well as gas particle filtration for photo, etch, CVD, PVD, and compound semiconductor process tools. Combined with the ability to measure parts-per-billion and even parts-per-trillion molecular contamination at the customer site, Entegris brings gas purification and filtration to the entire process, even to the cleanroom.
Entegris' innovative gas microcontamination control products and technologies help ensure our customers are equipped with the latest technologies and are prepared for the challenges of tomorrow's advanced devices. One recent example is the CHS™ controlled humidity source used to introduce humidity to process and carrier gases such as CDA (clean dry air) and N2, providing a continuous source of ultrapure humidified gas to the process tool.
Entegris works closely with OEM's and end users for custom designs to meet specific process or tool requirements, including FOUP and stocker applications.