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ChamberGard™ fast vent diffusers provide rapid venting to atmosphere without disturbing or adding particles to wafers in the chamber, increasing system throughput by minimizing load lock vent cycle times. They combine the flow characteristics of a diffuser with a high-efficiency filter to increase efficiency and throughput. Gentle flow characteristics in a clean diffuser/filtration media offer increased throughput with rapid venting to atmosphere. Ultrapure, diffused gas is delivered to the process chamber, minimizing on-wafer defects. Diffusers are compatible with most system designs for easy installation or retrofit into load lock chambers, cooling chambers, transfer chambers and process chambers.
Ultra-clean fast-vent diffusers to particles and vent times in load lock and transfer chambers.