Entegris Semicon West 2008 and InterSolar 2008 Featured Products
(Published: Monday, July 14, 2008)
Entegris Inc. will debut six new customer solutions to help semiconductor manufacturers lower costs and increase yields at SEMICON West 2008 and Intersolar North America 2008 in San Francisco.
Highlighted products include:
- Torrento™ 15 nm Retention Rating Nondewetting Teflon® Filter
Liquid filter for wet etch and clean processes capable of retaining particles as small as 15 nm without sacrificing flow rate - Impact® 5 nm Filter
Industry's first 5 nm photoresist filter - SiLVERSET™ Chemical Air Filters
Innovative filter media designed to control airborne molecular contaminants in the photolithography bay - Scanner Pre-Filter System
Provides lithography scanners with enhanced protection from contamination due to low molecular weight silicon organic compounds - IntelliGen® HV Dispense System
Enables faster, safer changeout of filters through the precision dispense system for high viscosity fluids - 450 mm Wafer Handling Products
A complete set of prototype shipper and process carriers for handling 450 mm wafers
Click here to view the Semicon West 2008 and InterSolar North America 2008 media kit.