CHASKA (Minneapolis), Minnesota - July 6, 2006 - Entegris, Inc. (Nasdaq: ENTG) announced today that it will introduce its LiquidLens™ UPW (ultrapure water) purification system next week at the semiconductor global trade show SEMICON West 2006 in San Francisco. This immersion lithography innovation combines advanced technology and process expertise from both Entegris and the former Mykrolis as a result of their merger in August 2005.
Immersion is the newest lithography technique for printing 45 nanometer (nm) or smaller features on semiconductor wafers, using ultra pure water between the optical lens and the wafer. The UPW lens is utilized to significantly improve image resolution. The water must be extremely pure as the smallest impurity can damage image resolution, react with the photoresist, or contaminate the lens. To achieve this requirement, the LiquidLens™ system provides the highest water purity level at the temperature and pressure required. Entegris has delivered several LiquidLens™ systems for evaluation and process development use to several major customers. According to Entegris, these leading companies are turning to the LiquidLens™ system to ensure that precisely controlled UPW is provided to advanced lithography processes as the companies move to production.
ABOUT ENTEGRIS
Entegris (merged with Mykrolis in August 2005) is the global leader in materials integrity management, delivering a wide range of products for purifying, protecting and transporting critical materials used in processing and manufacturing in semiconductor and other high tech industries. Entegris is ISO 9001 certified and has manufacturing, customer service and/or research facilities in the United States, China, France, Germany, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information can be found at www.entegris.com.