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The Rinsegard® HPX disposable filter optimizes wafer quality by removing trace metallic ions, even from ultrapure water. Trace metals in ultrapure water—at the wet etch, clean process and especially the rinse stages—can increase metal contamination of the wafer and decrease minority carrier lifetime measurement. Metal impurities can affect quality, even when using ultrapure water. But detecting low concentrations of trace metals presents a challenge. Conventional resistivity monitoring equipment cannot accurately measure or monitor trace metallic ions in the low parts-per-trillion (ppt) range. The Rinsegard HPX disposable filters remove a finite mass of multi-valent metal ions from ultrapure water and offer superior particle performance, providing more than 99.9% removal at the selected retention rating.