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Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)

Plasma Enhanced Chemical Vapor Deposition (PECVD) Coatings

Amorphous, dense and microconformal coatings deposited at low temperature

Entegris specializes in deposition of high performance coatings using a proprietary low temperature (<150°C) PECVD processes. Developed from the Surmet™ specialty coating technologies, the coatings are deposited in high vacuum by plasma decomposition of precursor gases. PECVD deposition is used on a variety of vacuum compatible substrates including metals, alloys, ceramics, semiconductors and polymers.

Benefits:

Amorphous and dense
Ultra high pure (99.999%)
Microconformal: They replicate the surface finish of the substrate
Deposited on variety of substrates including metals, ceramics and polymers
Uniform deposition on complex 3-D objects
Wide area coating capability, including entire process chambers

Process Capabilities:
Entegris has chambers ranging from 12” to 40” diameter target area to accomodate different shapes and sized items

SilcoMax™ Coating

Ultrapure silicon carbide coating

Applications in semiconductor equipment
Oxidation protection, especially in the presence of moisture
Innovative low temperature plasma process to deposit a variety of silicon carbide coatings
Dense, micro-conformal, high purity coatings have very low residual stress
High purity, dense and micro-conformal coating technology

Silicon Oxide Coating

Particle reduction during semiconductor wafer processing and IR Optics

Oxidation/corrosion protection
Optically transparent
Excellent breakdown voltage
AR properties of the coating make it suitable for coating IR optics

Transimax™ Coating

Transparent hard silicon nitride coating

Low temperature vacuum plasma process to deposit a series of Silicon Nitride coatings
Suitable for high-temperature oxidation/corrosion protection of ceramic materials
Reduces particles during semiconductor wafer processing
Excellent breakdown voltage
Optically transparent

UltraC Diamond™ Coating

Ultimate abrasive wear resistance

For use in biomedical implants, air bearings, cutting, dicing and slicing tools along with other anti-friction and wear applicaitons
Stops the formation of macro and submicroscopic wear debris
Corrosion resistant
Extremely wear resistant
Ultra low friction
Super hard

UltraC-HT™ Coating

Exceptionally tough diamond-like carbon

Applications in semiconductor, medical, aerospace and air bearings
Mono-dimensionally modulated (MDM) coating system consists of individual layers of two materials differing in elastic modulus
Excellent abrasive/erosion wear resistance
Super lubricious
Extreme toughness
High strength

Ultrapure Silicon Coating

Dense, high performance, strongly-adherent, conformal coating of silicon

Dense, hard and micro-conformal
Excellent adhesion and compliance on a wide variety of substrates
Excellent surface smoothness
Low residual stress