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Plasma Enhanced Chemical Vapor Deposition (PECVD) Coatings

Amorphous, dense and conformal coatings deposited at low temperature

Entegris specializes in deposition of Silicon and Carbon based high-performance coatings using proprietary low temperature (<150°C) PECVD processes. The coatings are deposited in a high vacuum environment by plasma decomposition of precursor gases. The proprietary PECVD deposition deposition can be used to deposit coatings on a variety of vacuum compatible substrates including metals, alloys, ceramics, semiconductors and polymers.

 

Benefits:

  • Amorphous and dense
  • Ultra high purity (99.995%)
  • Microconformal coatings replicate the surface finish of the substrate
  • Uniform deposition on complex 3-D objects
  • Wide area coating capability, including large process chambers

 

 

Process Capabilities:
Entegris has coating chambers that can accomodate different shapes and sized items, up to 31" in diameter.
OxiMax™ Coating
Ultrapure, transparent silicon oxide coating
  • Oxidation and errosion resistant
  • Optically transparent
  • Excellent breakdown voltage
  • Particle reduction during semiconductor wafer processing
  • AR properties make it suitable for coating IR optics
SilicoMax™ Coating
Ultrapure silicon carbide coating
  • High-purity, dense and mirco-conformal coating with very low residual stress
  • Oxidation resistance, especially in the presence of moisture
  • High electrical resistivity
  • Corrosion resistant in acids and alkalis
  • Low-temperature plasma deposition process
  • Coating composition can be tailored from silicon rich to stoichiometic silicon carbide
  • Applications for semiconductor and optics markets
TranSiMax™ Coating
Transparent hard silicon nitride coating
  • Suitable for high-temperature oxidation/corrosion protection of ceramic materials
  • Optically transparent
  • Exhibits excellent breakdown voltage
  • Low-temperature vacuum plasma process
  • Coating composition can be tailored to deposit a family of silicon nitride coatings
  • Reduces particles and plasma attack during semiconductor wafer processing
UltraC Diamond™ Coating
Ultrahard diamond-like carbon coating
  • Extremely wear resistant and super hard
  • Exhibits ultra-low friction
  • Highly corrosion resistant
  • Stops the formation of macro and submicroscopic wear debris
  • For use in biomedical applications, air bearings, metal forming tools, plastic injection molded components, semiconductor chamber components and other anti-friction applications
UltraC-HT™ Coating
Exceptionally tough diamond-like carbon
  • Mono-dimensionally modulated (MDM) coating system consists of individual layers of two materials differing in elastic modulus
  • Excellent abrasive/erosion wear resistance
  • Extreme toughness
  • High strength
  • Super lubricious
  • Applications in semiconductor, medical, aerospace and oil exploration markets
UHP Silicon Coating
Ultra-high purity silicon coating
  • 99.995% purity
  • Dense, hard and micro-conformal
  • Excellent adhesion and compliance on a wide variety of substrates
  • Excellent surface smoothness
  • Low residual stress
  • Applications in semiconductor equipment and optics markets