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Planarcap® Filters

Point-of-Dispense Filters for CMP Slurry
Entegris’ Planarcap® family of CMP slurry filters are designed for point-of-dispense (POD) applications. Developed from the Mykrolis® contamination control technologies, Planarcap filters provide the critical performance balance between the removal of defect-causing agglomerate gels and the delivery of the necessary slurry solution to the wafer surface. Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Planarcap filters capture particles in silica, ceria or alumina slurries.
Planarcap LPX Disposable Filters
Point-of-use disposable filters for silica and alumina abrasives for oxide and copper CMP
  • Designed for use with silica and alumina slurry solutions – most typically used in copper, ILD, STI and tungsten CMP applications
  • Available in a wide range of retention ratings from 1 µm to 5 µm
  • Meets the needs of point-of-use CMP slurry filtration applications
  • Available as a disposable filters with Flaretek® fittings
  • All polypropylene construction with pleated filtration media
Planarcap TPX Disposable Filters
Point-of-use disposable filters for ceria and other smaller abrasive particles at low concentrations
  • Designed for use with ceria and other smaller abrasives
  • Designed with a tighter retention rating than Planarcap LPX – available at 0.3 µm
  • Meets the needs of point-of-dispense (POD) CMP slurry filtration applications
  • Available as a disposable filters with Flaretek® fittings
  • All polypropylene construction with pleated filtration media