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Wet etch and clean (WEC) processes touch wafers more than any single application in the semiconductor fab. WEC processes modify and clean the wafer surface with a critical influence towards meeting the demanding yield requirements of an effective fab. These processes utilize the most aggressive chemistries: strong acids, oxidizers, solvents, high temperatures and highly concentrated substances. The process materials and parameters must be controlled to levels other industries cannot achieve in terms of repeatability and consistency. Entegris provides the solutions to succeed under these extreme conditions.
To find product information on Entegris filtration solutions, go to the Filtration Product Catalog
To find product information on Entegris fluid handling solutions, go to the Fluid Handling Product Catalog
To find product information on Entegris purification solutions, go to the Purification Product Catalog
To find product information on Entegris wafer handling solutions, go to the Wafer/ Reticle Handling Product Catalog
Designed for tool space saving and easy filter cartridge changeout.
Designed for rapid particle removal in HF and BOE recirculation baths processes.
PTFE membrane filter designed to efficiently remove particles from a broad range of acids, bases, solvents and other process chemicals.
Designed for filtration of high-purity process fluids at very low flow rates.
Designed as a cost effective solution to a variety of chemistries: including high-pH solutions, copper and nickel plating applications.
Most advanced dual-retention filtration for critical DHF/BOE cleaning applications
Designed to remove metal ion contamination from ultrapure water and some organic solvents.
Designed for use in advanced liquid filtration with both aqueous and non-aqueous chemistries. All PTFE membranes.
Designed for advanced wet etch and clean applications requiring the highest flow rate performance in aqueous chemistries.