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Photolithography

Contamination control and microenvironment solutions

Controlling sources of contamination and protecting wafers in process microenvironments are key challenges in photolithography applications. Entegris provides the industries most comprehesive portfolio of solutions to these problems: including liquid, air and gas filtration, gas diffusers, gas purifiers, precision dispense systems, immersion lithography ultrapure water purification systems, wafer transport, and reticle haze prevention technologies. Entegris is at the forefront of contamination control and microenvironment developments in photolithography applications.

To find product information on Entegris filtration solutions, go to the Filtration Product Catalog

To find product information on Entegris fluid handling solutions, go to the Fluid Handling Product Catalog

To find product information on Entegris purification solutions, go to the Purification Product Catalog

To find product information on Entegris wafer handling solutions, go to the Wafer/ Reticle Handling Product Catalog

Filter products by Application or Process Step

Filter Results: Your selection returned the following items within this category.

Aeronex® Gas Purification Systems Designed for the removal of gaseous contaminants down to part-per-trillion levels in continuous high-flow systems.	Chemlock® Housings Designed for tool space saving and easy filter cartridge changeout.	Fluorogard® Filters Optimized for removal of films, gels, and hard particles from photoresist strippers and residue removers
Fluoroline™ Filters Designed for filtration of high-purity process fluids at very low flow rates.	GateKeeper® Gas Purifiers Designed for the removal of gaseous contaminants down to part-per-trillion levels with inorganic media.	GateKeeper® Gas Purifiers Designed for the removal of gaseous contaminants down to part-per-trillion levels with inorganic media.
Impact® Filters Designed for point-of-use (POU) photochemical applications with BARC, Resist , TARC and Spin-On Dielectric materials.	Microgard™ Filters Designed for high retention efficiency water, chemical and photochemical applications.	Optimizer® Filters Designed to control particles in many photochemicals: including solvents and DI Water.
Vaporsorb™ HVAC Chemical Filters Designed for HVAC chemical filtration of airborne molecular contamination.	Vaporsorb™ II Chemical Air Filters Designed for Track/Coater/Developer chemical filtration of airborne molecular contamination.	Wafergard® Gas Filters Designed for ultrapure gas system filtration.