Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)
Developed from the Mykrolis® contamination control technologies, Entegris provides a broad portfolio of liquid filters for detergent, cutiing, diamond CMP, CMP cleaning, photoresist coating, HMDS, thinner, developer, DI water, stripping, cleaning and jig coating chemistries and processes in hard disk drive (HDD) manufacturing applications such as device and mass storage memory.
Designed for prefiltration of DI Water and process chemistries.
Designed for point-of-use filtration in flat panel display manufacturing applications.
Designed for tool space saving and easy filter cartridge changeout.
PTFE membrane filter designed to efficiently remove particles from a broad range of acids, bases, solvents and other process chemicals.
Designed for point-of-use (POU) photochemical applications with BARC, Resist , TARC and Spin-On Dielectric materials.
Designed for high retention efficiency water, chemical and photochemical applications.
Designed to control particles in many photochemicals: including solvents and DI Water.
Planarcore® PVA brushes are designed to deliver superior performance and wafer-to-wafer uniformity in post-CMP wafer cleaning applications.
Designed for use in copper, STI, ILD and tungsten CMP applications to capture particles and gels in silica, ceria or alumina slurries.
Designed to remove metal ion contamination from ultrapure water and some organic solvents.
Designed for use in advanced liquid filtration with both aqueous and non-aqueous chemistries.