Minatec Conference Center
This conference brings together scientists, researchers, engineers, and technologists from research institutes and companies from around the world to present innovations at the forefront of mask lithography and mask technology.
Click here for more information on this event.
Conference Dates
January 18-20, 2010
Monday, January 18th, 2:15 pm - 5:15 pm
Tuesday, January 19th, 9:00 am - 5:40 pm
Wednesday, January 20th, 9:00 am - 3:20 pm
Click here for the Conference program
Technical Exhibition
Entegris will be part of the technical exhibition on January 19th and 20th.
The unique Clarilite® reticle haze prevention solution and the development/availability of an EUV reticle handling solution will be presented.