Point-of-Dispense (POD) filtration is a critical process safeguard to remove defect-causing slurry particles before contacting the wafer surface. This application note highlights common uses of POD filtration and investigates methods to mitigate these defect-causing particle excursions in CMP process applications. A full characterization of CMP slurry filter is also shared along with the advantages of various filtration approaches.
Click here to read more about Entegris POD filters and to download the Application Note.