The article, entitled “Wafer Carrier Evolved,” discusses the state of the industry and addresses how Entegris has met industry challenges by remaining on the forefront of wafer carrier research and development.  

The article specifically highlights the causes and costs of reticle haze in semiconductor processing and offers insight into the Clarilite reticle haze prevention system, which was recently introduced by Entegris. The solution features a new reticle pod, the RSP³, which uses a constant purge of low-humidity gas to maintain an extremely dry and clean environment surrounding the reticle. The system works to prevent haze formation and increases the amount of time between reticle cleaning and maintenance.  

Click here to find out more about the solution.

Click here to read the full article.

The Flat Panel Display fabrication environment is among the worlds most competitive and technologically complex. Device designers and manufacturers continually strive to satisfy the worldwide consumer’s appetite for larger displays, greater pixel resolution and feature-rich performance – all at a lower cost than the previous generation of technology. The needs to control contamination in air, gas and liquid process streams and safely transport substrates are now paramount areas of focus for process engineers and designers. Entegris provides the solutions to succeed under these extreme conditions in cell process, color filter and TFT applications.

Click here to learn more about Entegris flat panel display products.