Point-of-Dispense (POD) filtration is a critical process safeguard to remove defect-causing slurry particles before contacting the wafer surface. This application note highlights common uses of POD filtration and investigates methods to mitigate these defect-causing particle excursions in CMP process applications. A full characterization of CMP slurry filter is also shared along with the advantages of various filtration approaches.

Click here to read more about Entegris POD filters and to download the Application Note.

An article by Entegris scientists was featured in the November issue of Semiconductor International. The study discusses how knowledge of the mass transport coefficients of materials of construction can be essential to solving permeation in microenvironments.

Click here to read the full article.